| 摘要 |
PURPOSE: An apparatus and a method for removing noxious gas of a semiconductor manufacturing facility are provided to prevent a fire and an accident by removing the noxious gas included in exhaust gas. CONSTITUTION: An apparatus for removing noxious gas of a semiconductor manufacturing facility includes a body frame(10), a pre-processor(20), an intermediate processor(30), and a post-processor(50). The body frame includes an inlet and an outlet. The noxious gas is inputted through the inlet and the outlet. The pre-processor burns the noxious gas. The intermediate processor is filled with a gas remover. The intermediate processor absorbs and removes the noxious gas. The post-processor burns the remaining noxious gas again.
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