发明名称 PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS
摘要 [PROBLEMS]To provide a material for microlenses which has heat resistance, high resolution, and a high light-extraction efficiency.[MEANS FOR SOLVING PROBLEMS]The material is a positive resist composition comprising: (A) an alkali-soluble polymer which comprises unit structures having an aromatic fused ring or a derivative thereof; and (B) a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. This positive resist composition gives a coating film having a refractive index as measured at a wavelength of 633 nm of 1.6 or higher and a transmittance as measured at a wavelength of 400-730 nm of 80% or higher. Also provided is a process for producing a microlens which comprises the step of applying the positive resist composition to a substrate and the steps of drying, exposing, and developing the composition applied.
申请公布号 KR20100017758(A) 申请公布日期 2010.02.16
申请号 KR20097025823 申请日期 2008.05.14
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 NEGI TAKAYUKI;SAKAGUCHI TAKAHIRO;KISHIOKA TAKAHIRO
分类号 G03F7/039;G02B3/00 主分类号 G03F7/039
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