发明名称 SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To detect a surface position of a tested surface with high precision without being affected by fluctuation in an optical member. <P>SOLUTION: A surface position detecting apparatus includes: a light-sending optical system (4-11) which makes first light from a first pattern and second light from a second pattern incident at different incidence angles to a tested surface (Wa) to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the tested surface; a light-receiving optical system (31-24) which guides the first light and the second light reflected on the tested surface, to a first observation surface (23Aa) and to a second observation surface (23Ba), respectively, to form an observation image of the first pattern on the first observation surface and an observation image of the second pattern on the second observation surface; and a detecting section (23-21, PR) which detects position information of the observation image of the first pattern on the first observation surface and position information of the observation image of the second pattern on the second observation surface and which calculates a surface position of the tested surface, based on the position information. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009295977(A) 申请公布日期 2009.12.17
申请号 JP20090125321 申请日期 2009.05.25
申请人 NIKON CORP 发明人 HIDAKA YASUHIRO;ISHIKAWA MOTOHIDE
分类号 H01L21/027;G01B11/00;G03F7/207 主分类号 H01L21/027
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