OPTICAL CHARACTERISTICS ADJUSTING METHOD, EXPOSURE METHOD, AND MANUFACTURING METHOD OF DEVICE

摘要

PROBLEM TO BE SOLVED: To accurately predict a fluctuation amount of optical characteristics under the condition actually used, without acquiring and storing an accurate prediction model in advance.

SOLUTION: The invention is related to an adjusting method of focusing characteristics in forming a predetermined pattern image on a wafer using exposure light through a projection optical system. The adjusting method has: a step 101 for measuring a wavefront aberration of the projection optical system; a step 102 for adjusting the wavefront aberration; a step 104 which measures predetermined focusing characteristics among wavefront aberrations after exposure on the wafer through the projection optical system; and a step 105 which acquires parameter information for predicting a fluctuation amount of the predetermined focusing characteristics relative to the irradiation amount of exposure light with the projection optical system.

COPYRIGHT: (C)2009,JPO&INPIT