Optical system manipulating method for micro lithographic projection exposure system, involves causing polarization effect of lenses by pressure difference, where effect partially compensates disturbance of polarization distribution

摘要

The method involves adjusting a pressure difference between fluid pressure in an area adjacent to a set of light inflow surfaces, and another fluid pressure in an area adjacent to light withdrawal surfaces. Polarization effect of lenses (110) is caused by the pressure difference, where the polarization effect partially compensates disturbance of polarization distribution. Fluid is supplied in a gap (105) between the lenses. A polarization condition of light, which passes through the lens, is measured. An independent claim is also included for a micro lithographic projection exposure system comprising a lighting device.