| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can be made compact and perform maskless exposure with a stable operation. <P>SOLUTION: The exposure apparatus 10 includes a light source 12, a MEMS (micro electro mechanical system) optical scanner that repeatedly tilts mirrors M1 and M2, and an exposure optical system exposing an exposure object with the light from the light source through mirrors. In a step of obtaining a first scanning beam and a second scanning beam by scanning the exposure object with the light from the light source in different two directions by the mirrors tilted by the MEMS optical scanner and two-dimensionally scanning and irradiating the exposure object, a predetermined pattern is exposed on the exposure object by controlling at least one of cycles and phases of the first scanning beam and the second scanning beam. <P>COPYRIGHT: (C)2009,JPO&INPIT |
