| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for exfoliation which is suitable for exfoliating a direct material from a base material, where the direct material is obtained by photocuring a curable composition containing a polyallylene resin. SOLUTION: The composition for exfoliation contains, as a main component, a solvent A which comprises one or more compounds selected from among a compound group X. The compound group X consists of: a cyclic ether compound having a dielectric constant of 7 or larger; a noncyclic ether alcohol compound having a dielectric constant of 7 or larger; and an amide compound having a dielectric constant of 7 or larger. COPYRIGHT: (C)2009,JPO&INPIT |
