发明名称 |
METHOD FOR PLASMA-ASSISTED VAPOUR-PHASE CHEMICAL DEPOSITION OF A CARBON/METAL FILM |
摘要 |
The invention relates to a composite film including carbon and at least one metal, which is deposited by means of plasma-assisted vapour-phase chemical deposition using at least one chemical solution containing a solid or liquid metal precursor dissolved in at least one solvent forming a carbon source. In addition, the plasma is generated at a frequency of between 2OkHz and 50OkHz and preferably between 40 kHz and 440 kHz. |
申请公布号 |
WO2009007524(A3) |
申请公布日期 |
2009.05.22 |
申请号 |
WO2008FR00764 |
申请日期 |
2008.06.05 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE;THOLLON, STEPHANIE;DONET, SEBASTIEN |
发明人 |
THOLLON, STEPHANIE;DONET, SEBASTIEN |
分类号 |
C23C16/06;C23C16/26;C23C16/505 |
主分类号 |
C23C16/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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