发明名称 |
OPTO-ELECTRONIC AND ELECTRONIC DEVICES USING N-FACE OR M-PLANE GAN SUBSTRATE PREPARED WITH AMMONOTHERMAL GROWTH |
摘要 |
<p>A method for growing III-V nitride films having an N-face or M-plane using an ammonothermal growth technique. The method comprises using an autoclave, heating the autoclave, and introducing ammonia into the autoclave to produce smooth N-face or M-plane Gallium Nitride films and bulk GaN.</p> |
申请公布号 |
EP2041794(A2) |
申请公布日期 |
2009.04.01 |
申请号 |
EP20070809717 |
申请日期 |
2007.06.20 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA;JAPAN SCIENCE AND TECHNOLOGY AGENCY |
发明人 |
HASHIMOTO, TADAO;SATO, HITOSHI;NAKAMURA, SHUJI |
分类号 |
H01L29/04;H01L21/02;H01L33/16 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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