| 摘要 |
PROBLEM TO BE SOLVED: To provide an insulating film that can obtain excellent insulation without giving damage to other portions, to provide a method for forming the same, and to provide an electronic device equipped with the insulating film. SOLUTION: An evaporated insulating film 2, which is composed of oxide or nitride including at least one type of element selected from the group consisting of Al, Hf, Zr and Si, is formed on a substrate 1 by the evaporation method. After that, this evaporated insulating film 2 is processed by at least one type selected from the group of hydrogen plasma processing and oxygen plasma processing by setting the temperature of the substrate 1 at 300 to 500°C. COPYRIGHT: (C)2009,JPO&INPIT
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