GAS ELIMINATOR FOR SEMICONDUCTOR FACILITY

摘要

A removing apparatus of gas impurities is provided to saves a manufacture cost, to form a inclined stacked-arrayed eliminator structure by alternating a filtering plate perpendicularly or horizontally in order to perform a lower harness of a ventilation fan and to reduce a depth of the filtering plate in a completion. An eliminator is installed at a middle of a channel conduit in order to remove gas impurities passing through a channel structure. The eliminator is formed by stacking a filtering plate(15) having a plurality of wave cross sections at a constant angle. A wave flowing conduit of the filtering plate is crossed at a constant angle. The gas and the impurities flown straight according to the channel are not passed, and are filtered and dropped down by bumping each flow passage in oblique direction.