发明名称 NANO ORDERED FINE PATTERN CURCUIT AND ITS MANUFACTURING PROCESS
摘要 A nano scale fine pattern circuit and a method for manufacturing the same are provided to implement miniaturization of various electronic products. A method for manufacturing a nano scale fine pattern circuit includes the steps of: forming grooves with nanometer width and depth by irradiating a focused ion beam on a top surface of a carbon glass at predetermined width and interval(S1); heating a polyimide plate to have fusibility(S2); forming continuous nanometer concave units and convex units on a bottom surface of the polyimide plate by putting the polyimide plate on the top surface of the carbon glass and pressing the polyimide plate through a press(S3); separating the polyimide plate from the carbon glass after removing the fusibility by cooling the polyimide plate(S4); putting the polyimide plate into a plasma gas body, plasma-processing the polyimide plate, and forming a copper plating layer on a top surface part including the concave unit and the convex unit of the polyimide plate through electroplating or electroless plating(S5); and removing the copper plating layer coated on the top surface including the convex unit of the polyimide plate through electrolytic polishing and forming a plated copper plating layer in the concave unit with a fine pattern circuit(S6).
申请公布号 KR20080085440(A) 申请公布日期 2008.09.24
申请号 KR20070026974 申请日期 2007.03.20
申请人 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY 发明人 LEE, CHANG WOO;LEE, JONG HYUN;KIM, JUN KI;KIM, JEONG HAN;LEE, SE HYUNG
分类号 H05K3/18 主分类号 H05K3/18
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