| 摘要 |
<p>An exposure apparatus for manufacturing a semiconductor device and an exposing method of the same are provided to control arbitrarily a long/short axis ratio of an exposing pattern by adjusting only a rotatory angle of a polarizer. An aperture(102) is used for diffracting light of a light source(101). A modified illumination system(103) includes a polarizer. The polarizer is rotated to change a polarizing direction of the diffracted light through the aperture. A circuit pattern is designed on a reticle(106) by irradiating the diffracted light. A lens unit(107) focuses the diffracted light on an exposing target. A driving unit rotates the polarizer on the basis of the aperture.</p> |
