| 摘要 |
PROBLEM TO BE SOLVED: To provide a Co-Fe-based alloy target material with a low permeability having satisfactory sputtering properties, and used for depositing a soft magnetic film of a Co-Fe-based alloy used for a vertical magnetic recording medium, and to provide a method for producing the Co-Fe-based alloy target material. SOLUTION: The Co-Fe-based alloy sputtering target material is expressed by compositional formula, in atomic ratio, of (Co<SB>X</SB>-Fe<SB>100-X</SB>)<SB>100-(Y+Z)</SB>-Zr<SB>Y</SB>-M<SB>Z</SB>, 20≤X≤70, 2≤Y≤15, 2≤Z≤10; wherein the M element(s) denotes one or more elements selected from Ti, V, Nb, Ta, Cr, Mo, W, B, Si, Al and Mg. The microstructure of the sputtering target material includes a sintered structure composed of an alloy phase essentially consisting of Co and an alloy phase essentially consisting of Fe, and a nonmagnetic Laves phase intermetallic compound of Fe<SB>2</SB>M is present in the alloy phase essentially consisting of Fe. COPYRIGHT: (C)2008,JPO&INPIT
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