发明名称 |
INDUCTIVELY-COUPLED PLASMA SOURCE |
摘要 |
A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma. |
申请公布号 |
WO2008076629(A3) |
申请公布日期 |
2008.08.14 |
申请号 |
WO2007US86367 |
申请日期 |
2007.12.04 |
申请人 |
MKS INSTRUMENTS, INC.;CHEN, XING |
发明人 |
CHEN, XING |
分类号 |
H01J37/32;H05H1/24;H05H1/48 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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