| 摘要 |
PROBLEM TO BE SOLVED: To provide a system for determining a measurement target capable of determining a measurement target appropriate for a plurality of measurement purposes to shorten a work period. SOLUTION: The system for determining a measurement target is provided with: a program selection unit 101 for selecting a plurality of candidate-determining programs corresponding to measurement items, in relation to a specified lot and a specified process in a plurality of processes; a candidate-determination unit 102 which executes the plurality of candidate-determining programs and determines a wafer eligible to a candidate for measurement in a specified work process for every candidate-determining program from a plurality of wafers making up the specified lot; and a unit for determining a measurement target 103 which superimposes pieces of information about the candidates for measurement each determined by the every candidate-determining program and determines a wafer to be designated as a measurement target. COPYRIGHT: (C)2008,JPO&INPIT
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