| 摘要 |
The invention provides for a facial landmark measuring device 10. The facial landmark measuring device 10 includes measuring means 12 for determining a height of a skull apex 52 relative to a mentalis 54. The facial landmark measuring device 10 further includes measuring means 14 for determining the positions of facial landmarks, such as, a nasion 56, a sub-nasion 58, a stomium 60, and a sub-labialis 62 relative to the skull apex 52 and the mentalis 54. The invention further provides for a method of obtaining facial landmark information and to an identification system. |
