发明名称 |
Alignment systems and methods for lithographic systems |
摘要 |
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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申请公布号 |
US7332732(B2) |
申请公布日期 |
2008.02.19 |
申请号 |
US20030665404 |
申请日期 |
2003.09.22 |
申请人 |
ASML NETHERLANDS, B.V. |
发明人 |
VAN BILSEN FRANCISCUS BERNARDUS MARIA;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;HINNEN PAUL CHRISTIAAN;VAN HORSSEN HERMANUS GERARDUS;HUIJBREGTSE JEROEN;JEUNINK ANDRE BERNARDUS;MEGENS HENRY;NAVARRO Y KOREN RAMON;TOLSMA HOITE PIETER THEODOOR;SIMONS HUBERTUS JOHANNES GERTRUDUS;SCHUURHUIS JOHNY RUTGER;SCHETS SICCO IAN;LEE BRIAN YOUNG BOK;DUNBAR ALLAN REUBEN |
分类号 |
G01B11/00;G01N21/86;G01B11/02;G01B21/00;G01N11/00;G02B5/18;G03F7/00;G03F7/20;G03F9/00;G03F9/02;H01L21/027;H01L21/3205;H01L21/68;H01L23/52;H01S3/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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