发明名称 Method of manufacturing a multi-purpose magnetic film structure
摘要 Provided are a multi-purpose magnetic film structure using a spin charge, a method of manufacturing the same, a semiconductor device having the same, and a method of operating the semiconductor memory device. The multi-purpose magnetic film structure includes a lower magnetic film, a tunneling film formed on the lower magnetic film, and an upper magnetic film formed on the tunneling film, wherein the lower and upper magnetic films are ferromagnetic films forming an electrochemical potential difference therebetween when the lower and upper magnetic films have opposite magnetization directions.
申请公布号 US2008009080(A1) 申请公布日期 2008.01.10
申请号 US20070898762 申请日期 2007.09.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM TAE-WAN;PARK WAN-JUN;PARK SANG-JIN;HWANG IN-JUN;KWON SOON-JU;KIM YOUNG-KEUN;GAMBINO RICHARD J.
分类号 H01L21/00 主分类号 H01L21/00
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