| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD system capable of preventing components in a vacuum tank from being damaged or the quality of a coating film from being unstable due to the generation of unstable anode glow. SOLUTION: In the plasma CVD system 10, when the asymmetrical pulse power Wp with the ground potential as the reference is supplied to a pipe 20 as a work while an adequate gas is introduced in the vacuum tank 12, plasma is generated in the vacuum tank 12. In this condition, the vacuum tank 12 connected to the ground potential works as an anode, and the anode glow is generated in the vacuum tank 12. However, an auxiliary anode 40 formed of a high melting point metal having the potential higher than that of the vacuum tank 12 is provided in the vacuum tank 12, the anode glow is concentrated on this auxiliary anode 40. In other words, the position of generation of the anode glow is fixed to the auxiliary anode 40. Thus, the anode glow is stabilized, and the influence by the anode glow is eliminated. COPYRIGHT: (C)2007,JPO&INPIT
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