<p>A raw powder mixture for ITO sinter production which can give an ITO sinter having excellent properties. The raw powder mixture for ITO sinter production is obtained from a mixture of an indium oxide powder and a tin oxide powder and has a logarithmic differential curve of pore volume distribution in which the cumulative pore volume for the pore volume diameters of 0.01-1.0 µm is 3.0-7.0 cm<SUP>3</SUP>/g. When this powder mixture is used to produce an ITO sinter, this ITO sinter can have extremely small pores therein. Thus, a sputtering target which is highly dense and has high quality can be supplied.</p>
