发明名称 |
THIN FILM HAVING A FINELY RUGGED SURFACE STRUCTURE AND ITS MANUFACTURING PROCESS |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film which has a finely rugged structure of a micrometer order or a nanometer order easily and efficiently given by a simple process and finds application in various fields and its manufacturing process. SOLUTION: The manufacturing process of the thin film involves a step to apply a solution obtained by dissolving a crystalline polymer in an organic solvent on the surface of a solid and a step to form a thin film having a finely rugged surface structure by evaporating the solvent in an open system or a closed system. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007161809(A) |
申请公布日期 |
2007.06.28 |
申请号 |
JP20050357646 |
申请日期 |
2005.12.12 |
申请人 |
NITTO DENKO CORP |
发明人 |
ODANE CHIHARU;FUNATSU ASAMI |
分类号 |
C08J5/18;B01D39/00;B29C41/04;B29C59/00;B82B1/00;B82B3/00 |
主分类号 |
C08J5/18 |
代理机构 |
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代理人 |
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地址 |
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