发明名称 THIN FILM HAVING A FINELY RUGGED SURFACE STRUCTURE AND ITS MANUFACTURING PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a thin film which has a finely rugged structure of a micrometer order or a nanometer order easily and efficiently given by a simple process and finds application in various fields and its manufacturing process. SOLUTION: The manufacturing process of the thin film involves a step to apply a solution obtained by dissolving a crystalline polymer in an organic solvent on the surface of a solid and a step to form a thin film having a finely rugged surface structure by evaporating the solvent in an open system or a closed system. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007161809(A) 申请公布日期 2007.06.28
申请号 JP20050357646 申请日期 2005.12.12
申请人 NITTO DENKO CORP 发明人 ODANE CHIHARU;FUNATSU ASAMI
分类号 C08J5/18;B01D39/00;B29C41/04;B29C59/00;B82B1/00;B82B3/00 主分类号 C08J5/18
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