发明名称 |
OBJECTIVE OPTICAL SYSTEM, ABERRATION MEASURING INSTRUMENT AND EXPOSURE DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To obtain an objective optical system which has a numerical aperture larger than 1 and whose aberration is satisfactorily corrected. <P>SOLUTION: The objective optical system is equipped with: a first optical member (31a) having nearly plane parallel form; a second optical member (31ba) turning its convex surface to an emitting side and having positive refractive power; a positive lens group (31bb); and a negative lens group (31bc) in order from an object side. An optical path between the first optical member and the second optical member is filled with a medium (Lm3) having a refractive index larger than the maximum numerical aperture on the incident side of the objective optical system. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007132981(A) |
申请公布日期 |
2007.05.31 |
申请号 |
JP20050323308 |
申请日期 |
2005.11.08 |
申请人 |
NIKON CORP |
发明人 |
HIRAGA KOICHI;MIZUKI SAORI |
分类号 |
G02B13/24;G01M11/02;G02B21/02;G02B21/16;H01L21/027 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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