发明名称 RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a hyperbranched polymer suitable as a polymer material for nanofabrication, in particular, photolithography, and to provide a hyperbranched polymer having an acid decomposition group at the end of a molecule of the hyperbranched polymer obtained by a living radical polymerization reaction of a styrene derivative. <P>SOLUTION: The hyperbranched polymer has a core portion prepared by a living radical polymerization of chloromethyl styrene or the like, and an acid decomposition group such as p-tert-butoxy styrene, which is linked to the core portion and present at the end of a molecule of the polymer. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007128104(A) 申请公布日期 2007.05.24
申请号 JP20060351091 申请日期 2006.12.27
申请人 LION CORP 发明人 KANEKO YUKIHIRO;SUZUKI KAORU;TAMURA MINORU;KUBO YOSHIYASU
分类号 G03F7/039;C08F12/16;C08F297/00;H01L21/027 主分类号 G03F7/039
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