| 摘要 |
At least one exemplary embodiment is directed to a method of exposing a substrate to light, including a measurement step of measuring position of a mark arranged on one of a substrate and a stage configured to hold the substrate and to move; a detection step of detecting a foreign particle on the mark based on a process performed in the measurement step; a removing step of removing the foreign particle on the mark in accordance with detection of the foreign particle in the detection step; a moving step of moving the stage based on the position of the mark measured in the measurement step; and an exposure step of exposing the substrate moved in the moving step to light.
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