发明名称 RESISTIVE MEMORY CELL, METHOD FOR FORMING THE SAME AND RESISTIVE MEMORY ARRAY USING THE SAME
摘要 A resistive memory cell employs a photoimageable switchable material, which is patternable by actinic irradiation and is reversibly switchable between distinguishable resistance states, as a memory element. Thus, the photoimageable switchable material is directly patterned by the actinic irradiation so that it is possible to fabricate the resistive memory cell through simple processes, and avoiding ashing and stripping steps.
申请公布号 US2007029546(A1) 申请公布日期 2007.02.08
申请号 US20060279640 申请日期 2006.04.13
申请人 SAMSUNG ELECTRONIC CO., LTD. 发明人 CHO BYEONG-OK;LEE MOON-SOOK;YASUE TAKAHIRO
分类号 H01L29/08 主分类号 H01L29/08
代理机构 代理人
主权项
地址