发明名称 Methods of patterning substrates; and templates comprising one or both of CdS and CdSe
摘要 The invention includes a template comprising one or both of CdS and CdSe adhered to a base in a desired pattern. The base can be any transparent or translucent material, and the desired pattern can include two or more separated segments. The template can be utilized for patterning a plurality of substrates. For instance, the substrates can be provided to have masking layers thereover, and the CdS and/or CdSe can be utilized as catalytic material to sequentially impart patterns in the masking layers. The imparting of the patterns can modify some regions of the masking layers relative to others, and either the modified or unmodified regions can be selectively removed to form patterned masks from the masking layers. Patterns from the patterned masks can then be transferred into the substrates.
申请公布号 US2007031762(A1) 申请公布日期 2007.02.08
申请号 US20050197877 申请日期 2005.08.05
申请人 MICRON TECHNOLOGY, INC. 发明人 SUBRAMANIAN KRUPAKAR M.
分类号 G03F7/26 主分类号 G03F7/26
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