MATERIAL FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PHOTORESIST PATTERN BY USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a material for forming a protective film that can simultaneously prevent alteration of a resist film during liquid immersion lithography and alteration of the liquid used for the liquid immersion lithography and that can result in formation of a resist pattern having a preferable profile without increasing the number of processes.

SOLUTION: The material for forming a protective film is composed of: an alkali-soluble polymer having a structural unit expressed by general formula (I); and an alcohol-based solvent.

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