| 摘要 |
Photomask manufacture is improved by adding assist bars 320, 340 for isolated features 300. The bars 320, 340 are added at a center to center spacing that corresponds to the center to center spacing for densely packed features. By matching the assist bars to the densely packed features, the combined diffraction pattern of the isolated features is modified to more closely resemble the diffraction pattern of the densely packed features. |
