| 摘要 |
PROBLEM TO BE SOLVED: To provide a mechanism for handling a glass substrate, which reliably transfer even a large-sized glass substrate to a conveyance tray, with a simple structure, in an inline-type treatment apparatus such as an inline-type vacuum deposition apparatus. SOLUTION: The mechanism for handling the glass substrate has at least two chambers of a preparation/takeout chamber and a treatment chamber, or three chambers of the preparation chamber, the treatment chamber and the takeout chamber, and is used in the inline-type treatment apparatus for surface-treating the glass substrate mounted on the conveyance tray in the treatment chamber, wherein the mechanism adsorbs the other region than that to be treated of the glass substrate with an electrostatic chuck and handles the glass substrate. COPYRIGHT: (C)2007,JPO&INPIT
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