发明名称 Light source device and exposure equipment using the same
摘要 A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying a material which becomes the target; a laser unit including an oscillation stage laser having a lower-order transverse mode and at least one amplification stage laser for amplifying a lower-order transverse mode laser beam generated by the oscillation stage laser, for irradiating the target with the amplified laser beam to generate plasma; and a collection optical system for collecting the extreme ultra violet light emitted from the plasma to output the collected extreme ultra violet light.
申请公布号 US7078717(B2) 申请公布日期 2006.07.18
申请号 US20040806812 申请日期 2004.03.22
申请人 GIGAPHOTON INC. 发明人 MIZOGUCHI HAKARU
分类号 H01J35/20;G03F7/20;H05G2/00 主分类号 H01J35/20
代理机构 代理人
主权项
地址