发明名称 Methods for manufacturing semiconductor device, semiconductor device and metal mold
摘要 A method for manufacturing a semiconductor device including: fixing each of a plurality of semiconductor substrates onto a surface of a wiring substrate in which a perforation is formed in advance; covering the surface of the wiring substrate with a metal mold having a protrusion on an inner surface along the perforation; wholly sealing the plurality of semiconductor substrates with a sealing resin by introducing the sealing resin into the metal mold while forming a thin region in the sealing resin along the perforation; and dividing the wiring substrate into a plurality of chips by splitting the wiring substrate and the sealing resin along the perforation in the wiring substrate and the thin region in the sealing resin.
申请公布号 US2006071318(A1) 申请公布日期 2006.04.06
申请号 US20050230266 申请日期 2005.09.19
申请人 YAMAMURA TOMOYOSHI 发明人 YAMAMURA TOMOYOSHI
分类号 H01L23/02 主分类号 H01L23/02
代理机构 代理人
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