发明名称 |
HALF-TONE TYPE PHASE SHIFT MASK BLANK AND HALF-TONE TYPE PHASE SHIFT MASK |
摘要 |
In a halftone-type phase-shift mask blank having a phase shifter film 5 , the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less. |
申请公布号 |
KR20060026923(A) |
申请公布日期 |
2006.03.24 |
申请号 |
KR20060013523 |
申请日期 |
2006.02.13 |
申请人 |
HOYA CORPORATION |
发明人 |
SHIOTA YUKI;NOZAWA OSAMU;MITSUI HIDEAKI;OHKUBO RYO |
分类号 |
H01L21/027;G02B5/30;G03F1/32 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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