发明名称 HALF-TONE TYPE PHASE SHIFT MASK BLANK AND HALF-TONE TYPE PHASE SHIFT MASK
摘要 In a halftone-type phase-shift mask blank having a phase shifter film 5 , the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less.
申请公布号 KR20060026923(A) 申请公布日期 2006.03.24
申请号 KR20060013523 申请日期 2006.02.13
申请人 HOYA CORPORATION 发明人 SHIOTA YUKI;NOZAWA OSAMU;MITSUI HIDEAKI;OHKUBO RYO
分类号 H01L21/027;G02B5/30;G03F1/32 主分类号 H01L21/027
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