发明名称 Method for forming multi-layered structure, method for manufacturing wiring substrate, and method for manufacturing electronic apparatus
摘要 A method for forming a multi-layered structure using a droplet-discharging device; the method comprises: (A) forming a first insulating-material layer covering the material-body surface by discharging a droplet of a first insulating material including a first photosensitive resin to a material-body surface; (B) obtaining a first insulating layer by curing in the first insulating-material layer; (C) forming a pattern of an electric conductive material layer on the first insulating layer by discharging a droplet of an electric conductive material to the first insulating layer; and (D) forming a wiring pattern on the first insulating layer by activating the pattern of the electric conductive material layer.
申请公布号 US2006060944(A1) 申请公布日期 2006.03.23
申请号 US20050196677 申请日期 2005.08.04
申请人 SEIKO EPSON CORPORATION 发明人 SHINTATE TSUYOSHI;SAKURADA KAZUAKI;YAMADA JUN
分类号 H01L29/06;H01L23/495;H01L27/082 主分类号 H01L29/06
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