发明名称 |
Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same |
摘要 |
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB(Post Exposure Baking) temperature sensitivity.
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申请公布号 |
US2006057494(A1) |
申请公布日期 |
2006.03.16 |
申请号 |
US20050227877 |
申请日期 |
2005.09.15 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
LEE JAE-WOO;LEE JUNG-YOUL;KIM DEOG-BAE;KIM JAE-HYUN;SON EUN-KYUNG |
分类号 |
G03C1/76 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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