| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a dry etching method and a dry etching system without destroying a membrane and lowering etching characteristics at the time of the dry etching of membranes, such as an EB mask. <P>SOLUTION: A stage is divided into some regions so that dry etching may be performed by setting up the stage temperature, the quantity of gas flow and pressure for heat conduction for every region. The dry etching method and system comprises (1) stages divided integrally into some regions by a partition 25, (2) a mechanism 27 for setting up and maintaining the stage temperature respectively for the divided stage, and (3) a mechanism 28 for setting up and maintaining the quantity of gas flow and pressure for heat conduction and pressure respectively for the divided stages. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
