| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure apparatus causing no variations in exposure even when the scanning speed of a substrate stage changes. <P>SOLUTION: The apparatus is a projection exposure apparatus for scanning and exposing a substrate by moving a mask and a photosensitive substrate to illumination light, and it is provided with a means of detecting the illuminance of the illumination light, an illuminance controlling means of maintaining the detected illuminance of the illumination light at a commanded illuminance value, and an exposure amount controlling means of controlling the commanded illuminance value according to the exposure speed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
