发明名称 |
Overlay box structure for measuring process induced line shortening effect |
摘要 |
The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment ( 900 ), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate ( 940 a), from the composite image the user may determine the total line ( 940 b) shortening (TLS) and the equipment line ( 940 c) shortening (ELS). The process line shortening (PLS) is determined ( 940 d) as a function of TLS and ELS.
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申请公布号 |
US2005250026(A1) |
申请公布日期 |
2005.11.10 |
申请号 |
US20040841147 |
申请日期 |
2004.05.07 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
YAMAGUCHI YUJI;LEROUX PIERRE |
分类号 |
G03C5/00;G03F7/20;G03F9/00;G06K9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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