Vacuum deposition device for continuously depositing an optical recording layer comprises evacuated chambers arranged directly after a sluice chamber or between two sluice chambers each having a gate valve

摘要

Vacuum deposition device comprises evacuated chambers arranged directly after a sluice chamber (3) or between two sluice chambers each having a gate valve (11), and units for preventing a gas exchange in one of the chambers and/or in further chambers arranged between the intermediate spaces of the chambers, sluice chambers as well as processing chambers. A magnetron sputtering source formed as a target, gas feeding systems for an operating gas and a guide for supports (2) moving via a linear drive are arranged in the processing chambers as coating chambers. The surface of the target and the surfaces of the recording media (1) to be coated lie opposite each other. A unit for cooling recording media is arranged in at least one processing chamber as a cooling chamber (7). The supports are guided vertically, horizontally or in a slanted manner from chamber to chamber as well as in the chambers.