发明名称 DEVICE AND PROCESS FOR PREPARING PLANE TEM SAMPLE
摘要 PROBLEM TO BE SOLVED: To easily prepare a plane TEM sample selectively remaining a specific surface between layers of a sample comprising a multilayer film. SOLUTION: The device for preparing a plane TEM sample comprises a glow discharge emission spectral analysis (GDS) device part 102 and an ion milling device part 103, and sets a control program corresponding to a specific element contained in a sample 5 comprising a multilayer film. A thin-film plane TEM sample is prepared by driving the GDS device part 102 to sputter the sample 5 until a specific surface is exposed while confirming the sputtering depth direction, and then driving the ion milling device part 103 to sputter the sample 5 by ion milling from an opposite surface in a measurement region by the GDS device part 102, thereby selectively remaining a specific surface formed between the layers of the sample 5 comprising a multilayer film without destroying the surface. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005069924(A) 申请公布日期 2005.03.17
申请号 JP20030301118 申请日期 2003.08.26
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KAI HARUKA
分类号 G01N23/225;G01N1/28;G01N1/32;G01N21/67;(IPC1-7):G01N1/28 主分类号 G01N23/225
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