发明名称 |
Substrate processing apparatus and method for adjusting a substrate transfer position |
摘要 |
A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.
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申请公布号 |
US2005016818(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20040859340 |
申请日期 |
2004.06.03 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ITO KAZUHIKO;ISHIMARU KAZUTOSHI;OOKURA JUN;KINOSHITA MICHIO;DOUKI YUICHI |
分类号 |
H01L21/68;B05B12/12;B05B13/02;H01L21/00;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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