发明名称 |
Interconnection substrate having metal columns covered by a resin film, and manufacturing method thereof |
摘要 |
An interconnection substrate comprises an uppermost interconnection layer having a plurality of terminal pads located at positions corresponding to a plurality of solder bumps (external connection terminals) provided on a semiconductor element which is to be mounted on the interconnection substrate. The interconnection substrate also has a metal column formed on each of the terminal pads and has a resin film covering a side surface of the metal column. The interconnection substrate further has an insulating layer formed on the uppermost interconnection layer so that a gap is formed between the insulating layer and an outer peripheral surface of the resin film.
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申请公布号 |
US6828669(B2) |
申请公布日期 |
2004.12.07 |
申请号 |
US20000736864 |
申请日期 |
2000.12.14 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
IIJIMA TAKAHIRO;WAKABAYASHI SHINICHI;MATSUDA YUICHI |
分类号 |
H01L21/60;H01L21/768;H01L23/12;H01L23/498;H05K1/02;H05K1/11;H05K1/18;H05K3/34;H05K3/46;(IPC1-7):H01L23/12 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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