发明名称 Interconnection substrate having metal columns covered by a resin film, and manufacturing method thereof
摘要 An interconnection substrate comprises an uppermost interconnection layer having a plurality of terminal pads located at positions corresponding to a plurality of solder bumps (external connection terminals) provided on a semiconductor element which is to be mounted on the interconnection substrate. The interconnection substrate also has a metal column formed on each of the terminal pads and has a resin film covering a side surface of the metal column. The interconnection substrate further has an insulating layer formed on the uppermost interconnection layer so that a gap is formed between the insulating layer and an outer peripheral surface of the resin film.
申请公布号 US6828669(B2) 申请公布日期 2004.12.07
申请号 US20000736864 申请日期 2000.12.14
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 IIJIMA TAKAHIRO;WAKABAYASHI SHINICHI;MATSUDA YUICHI
分类号 H01L21/60;H01L21/768;H01L23/12;H01L23/498;H05K1/02;H05K1/11;H05K1/18;H05K3/34;H05K3/46;(IPC1-7):H01L23/12 主分类号 H01L21/60
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