| 摘要 |
PROBLEM TO BE SOLVED: To realize a structure in which an array substrate surface is uniformly coated with a photoresist layer. SOLUTION: An electrode mount area 4 includes a plurality of external connection electrodes 12 arranged on an array substrate, insulating layers 21 and 22 which are layered in order on the array substrate, and in areas between the external connection electrodes 12 and on ends of the external connection electrodes 12, and a separate insulating layer 23 layered on the insulating layer 22, and also includes a transparent electrode 24 on the external connection electrodes 12. An electrode non-mount area 5, on the other hand, has an uneven structure wherein a dummy structure 28 having insulating layers 25 and 25 and an insulating layer 27 layered in order on the array substrate 1 is arranged almost similarly to the arrangement pattern of the separate insulating layer 23. The electrode mount area 4 and electrode non-mount area 5, therefore, have similar uneven structures and then a photoresist layer can uniformly be applied after the uneven structures are formed. COPYRIGHT: (C)2005,JPO&NCIPI |
