发明名称 ELECTRODE STRUCTURE FOR ELECTRONIC AND OPTO-ELECTRONIC DEVICES
摘要 <p>The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer ( 204 ), a nonmetal layer ( 206 ) formed on the conductive layer, a fluorocarbon layer ( 208 ) formed on the nonmetal layer, a structure ( 210 ) formed on the structure. The electrode may further comprise a buffer layer ( 205 ) between the conductive layer and the nonmetal layer.</p>
申请公布号 EP1457093(A1) 申请公布日期 2004.09.15
申请号 EP20020783440 申请日期 2002.11.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ALVARADO, SANTOS, F.;BEIERLEIN, TILMAN, A.;CRONE, BRIAN;DRECHSLER, UTE;GERMANN, ROLAND, W.;KARG, SIEGFRIED, F.;MUELLER, PETER;RIEL, HEIKE;RIESS, WALTER;RUHSTALLER, BEAT;SEIDLER, PAUL;WIDMER, ROLAND, W.
分类号 H01L51/50;H01L51/52;H05B33/10;H05B33/22;(IPC1-7):H05B33/22;H01L51/20 主分类号 H01L51/50
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