发明名称 METHOD AND APPARATUS FOR MANUFACTURING SYNTHETIC QUARTZ GLASS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing synthetic quartz glass in which resistance to ultraviolet rays is easily improved. SOLUTION: The apparatus for manufacturing the synthetic quartz glass is provided with: a synthesis furnace 11; a synthesis burner 12 for forming a synthesis flame by jetting a gaseous starting material containing an organic silicon compound, a combustion supporting gas containing oxygen and a combustion gas burned by oxygen into the synthesis furnace 11; and a target 14 for forming an ingot 15 by depositing quartz glass fine particles produced by the synthesis flame. The apparatus is constituted so that the synthesis surface 20 of the ingot 15 is heated to a fusing and vitrifying temperature by the synthesis flame. A sub-burner 22 is provided at a position different from that of the synthesis burner 12 for blowing a hydrogen-containing gas to the non-hardened region around the region heated to the fusing and vitrifying temperature. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004142997(A) 申请公布日期 2004.05.20
申请号 JP20020310508 申请日期 2002.10.25
申请人 NIKON CORP 发明人 FUSHIMI KOICHI;FUJIWARA MASASHI
分类号 C03B8/04;H01L21/027;(IPC1-7):C03B8/04 主分类号 C03B8/04
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