| 摘要 |
PROBLEM TO BE SOLVED: To accurately detect waviness in a sample to be inspected also to a variation of brightness in a patterning light source, and the position deviation of the sample to be inspected. SOLUTION: The sample W to be inspected is irradiated with a specific light source pattern by the patterning light source 1 to image the light source pattern applied to the sample W to be inspected by a camera 2 (S1). Then, after the center-of-gravity position of the brightness in the light source pattern to a specific threshold is calculated (S2) by an image processing apparatus 3 based on the brightness of pixels that are imaged by the camera 2, a pixel at the brightness center-of-gravity position and the adjacent pixel are weighted (S3), smoothing processing is made (S8) based on the pixel value of the weighted pixels, and the waviness in the surface of the sample W to be inspected is judged (S12). COPYRIGHT: (C)2004,JPO
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