发明名称 |
ELECTROSTATIC DISCHARGE PROTECTION TRANSISTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: An ESD(Electrostatic Discharge) protection transistor and a method for manufacturing the same are provided to be capable of improving uniformity of current path. CONSTITUTION: A well junction region is formed in a semiconductor substrate. An isolation layer(114) is formed in the well junction region. A source region(118) and a drain region(120) are defined by the isolation layer. A source contact(124) and a drain contact(126) are connected to the source region(118) and the drain region(120) via an interlayer dielectric, respectively. A pad(128) is connected to the drain contact(126). At the time, the isolation layer(114) and the drain contact(126) have a closed loop shape.
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申请公布号 |
KR20040003235(A) |
申请公布日期 |
2004.01.13 |
申请号 |
KR20020037885 |
申请日期 |
2002.07.02 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KIM, GI SEOK;LEE, GEUN U;PARK, SEONG GI;SIM, GEUN SU |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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