发明名称 In situ measurement of slurry distribution
摘要 A method and apparatus for measuring a slurry distribution. A slurry solution is doped with a light absorbing dye having an absorptivity sensitive to a physical parameter such as acidity, temperature or pressure. The solution is delivered between a platen and substrate in a first physical state where it absorbs light. A laser beam is generated, transmitted through the slurry layer, reflected off of the substrate, and detected by a photodetector. The thickness of the slurry is measured from its absorptivity and the transmittance of the laser beam. A relative motion between the light source and substrate allows the slurry layer thickness to be measured as a function of distance from the center of the substrate. A final water rinse removes the slurry and brings any residual slurry to a/second physical state where it does not absorb light.
申请公布号 US6657726(B1) 申请公布日期 2003.12.02
申请号 US20000643830 申请日期 2000.08.18
申请人 APPLIED MATERIALS INC 发明人 WANG YUCHUN;SWEDEK BOGUSLAW
分类号 B24B49/12;B24B57/02;G01B11/06;G01B11/28;(IPC1-7):G01N21/59 主分类号 B24B49/12
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