发明名称 |
ELEMENT DISTRIBUTION OBSERVING METHOD AND DEVICE THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide an element distribution observing method and a device therefor capable of suppressing the generation of artifacts caused by the thickness or density of a material and artifacts caused by diffraction contrast. SOLUTION: Electron beam intensities are found with respect to three different energy loss areas in total, that is, two energy loss areas including no core loss electrons and one energy loss area including core loss electrons, and element distribution is found based on the three areas and the electron beam intensities. COPYRIGHT: (C)2004,JPO
|
申请公布号 |
JP2003329618(A) |
申请公布日期 |
2003.11.19 |
申请号 |
JP20020136433 |
申请日期 |
2002.05.13 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TANIGUCHI YOSHIFUMI;KAJI KAZUTOSHI;UEKI YASUMITSU;ISAGOZAWA SHIGETO |
分类号 |
G01N23/08;G01N23/02;G01N23/04;H01J37/05;H01J37/26;H01J37/28;(IPC1-7):G01N23/08 |
主分类号 |
G01N23/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|