发明名称 Mask having pattern areas whose transmission factors are different from each other
摘要 A mask is composed of a substrate, and a pattern having a transmission factor formed on the substrate by using a material, wherein an optical path length difference between light beams respectively passing the pattern and an area adjacent thereto is greater thanand less thanwhere lambda is a wavelength of incident light, and m is an integer.</PTEXT>
申请公布号 US6632574(B1) 申请公布日期 2003.10.14
申请号 US19990345501 申请日期 1999.07.01
申请人 CANON KABUSHIKI KAISHA 发明人 SUGITA MITSURO
分类号 G03F1/08;G03F1/14;G03F1/54;G03F1/68;G03F7/00;G03F7/20;H01L21/027;(IPC1-7):G03F9/00;G03C5/00 主分类号 G03F1/08
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